Chemical instability of graphene oxide following exposure to highly reactive radicals in advanced oxidation processes

文献类型: 外文期刊

第一作者: Wang, Zhaohui

作者: Wang, Zhaohui;Sun, Linyan;Yang, Fei;Feng, Min;Liu, Jianshe;Wang, Zhaohui;Lou, Xiaoyi

作者机构:

关键词: Graphene oxide;Sulfate radical;Hydroxyl radical;Decomposition;Advanced oxidation processes

期刊名称:JOURNAL OF COLLOID AND INTERFACE SCIENCE ( 影响因子:8.128; 五年影响因子:7.211 )

ISSN:

年卷期:

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收录情况: SCI

摘要: The rapidly increasing and widespread use of graphene oxide (GO) as catalyst supports, requires further understanding of its chemical stability in advanced oxidation processes (AOPs). In this study, UV/H2O2 and UV/persulfate (UV/PS) processes were selected to test the chemical instability of GO in terms of their performance in producing highly reactive hydroxyl radicals ((OH)-O-center dot) and sulfate radicals (SO4 center dot-), respectively. The degradation intermediates were characterized using UVvisible absorption spectra (UVvis), X-ray photoelectron spectroscopy (XPS), transmission electron microscopy (TEM), Raman spectroscopy, and matrix-assisted laser desorption and ionization time-of-flight mass spectrometry (MALDI-TOF-MS). Experimental data indicate that UV/PS process was more effective in enhancing GO degradation than the UV/H2O2 system. The overall oxygen-containing functionalities (e.g. C-O, C=O and O-C=O groups) dramatically declined. After radical attack, sheet-like GO was destructed into lots of flakes and some low-molecular-weight molecules were detected. The results suggest GO is most vulnerable against SO4 center dot- radical attack, which deserves special attention while GO acts as a catalyst support or even as a catalyst itself. Therefore, stability of GO and its derivatives should be carefully assessed before they are applied to SO4 center dot- based AOPs. (C) 2017 Elsevier Inc. All rights reserved.

分类号: O647`O648

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