文献类型： 外文期刊
作者： Jiao, L. Z. 1 ; Dong, D. M. 1 ; Zheng, W. G. 1 ; Wu, W. B. 1 ; Shen, C. J. 1 ; Yan, H. 1 ;
作者机构： 1.Technol Agr, Natl Engn Res Ctr Informat, Beijing 100097, Peoples R China
关键词： Evanescent wave sensor; Silica fiber; Chemical etching; Fiber spectrometer
期刊名称：OPTIK （ 影响因子：2.443； 五年影响因子：1.955 ）
ISSN： 0030-4026
年卷期： 2013 年 124 卷 8 期
页码：
收录情况： SCI
摘要： In order to make high sensitive optical fiber evanescent wave sensors, it is necessary to accurately control the etching process of optical fiber. Traditional methods used time as a parameter to control fiber etching process, corresponding to different fiber diameter. It was easy to be influenced by surrounding temperature and corrosive reagent density. In this paper, fiber spectrometer is used to monitor fiber etching process. Fiber diameter corresponding different absorbance is obtained at different temperature and corrosive reagent density and these results are almost accordant. According to this conclusion, a simple solution to monitor fiber etching process based on single waveband laser response is proposed. Through utilizing this method accurate control of the optical fiber etching process is realized. (C) 2012 Elsevier GmbH. All rights reserved.
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