The basal level of salicylic acid represses the PRT6 N-degron pathway to modulate root growth and stress response in rice

文献类型： 外文期刊

第一作者： Xu, Zhuang

作者： Xu, Zhuang;Li, Ruili;Xu, Lei;Yi, Keke;Jia, Xianqing;Wang, Long

作者机构：

关键词： salicylic acid; PRT6 N-degron pathway; root growth; stress response

期刊名称：PLANT COMMUNICATIONS （ 影响因子：11.6； 五年影响因子：11.8 ）

ISSN： 2590-3462

年卷期： 2025 年 6 卷 4 期

页码：

收录情况： SCI

摘要： Maintaining a stable basal level of salicylic acid (SA) is crucial for plant growth, development, and stress response, although basal levels of SA vary significantly among plant species. However, the molecular mechanisms by which basal SA regulates plant growth and stress response remain to be clarified. In this study, we performed a genetic screen to identify suppressors of the root growth defect in Osaim1, a rice mutant deficient in basal SA biosynthesis. We found that mutation of the E3 ligase OsPRT6, a key component of the Arg/N-degron pathway, can rescue the root growth defect of Osaim1. Further analysis revealed that OsWRKY62 and OsWRKY76 act as substrates of the OsPRT6 N-degron pathway to modulate root growth. We demonstrated that reducing the basal SA level activates the PRT6 N-degron pathway and that basal SA modulates the stress response in part through the PRT6 N-degron pathway. Importantly, the effects of basal SA levels on the PRT6 N-degron pathway are conserved across plant species. Taken together, these findings reveal a novel regulatory mechanism by which basal SA represses the PRT6 N-degron pathway to modulate root growth and abiotic stress response in rice.

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