Identification of molecular markers for resistance to Septoria nodorum blotch in durum wheat

文献类型: 外文期刊

第一作者: Cao, W

作者: Cao, W;Hughes, GR;Ma, H;Dong, Z

作者机构:

关键词: RAPD;SCAR;durum wheat;Stagonospora nodorum

期刊名称:THEORETICAL AND APPLIED GENETICS ( 影响因子:5.699; 五年影响因子:5.565 )

ISSN: 0040-5752

年卷期: 2001 年 102 卷 4 期

页码:

收录情况: SCI

摘要: The development of Septoria nodorum blotch-resistant cultivars has become a high priority objective for durum wheat breeding programs. Marker-assisted selection enables breeders to improve selection efficiency. In order to develop markers for resistance to Septoria nodorum blotch, a set of F-5 recombinant inbred lines, derived from the crosses Sceptre/3-6, Sceptre/S9-10 and Sceptre/S12-1, was developed based on the F-2-derived family method. Two RAPD markers, designated UBC521(650) and RC37(510), were detected by bulked segregant analysis and located approximately 15 and 13.1 centiMorgans (cM) from the resistance gene snbTM, respectively. A SCAR marker was also successfully developed for marker-assisted selection in breeding programs based on the sequence of the RAPD marker UBC521650. This is the first report of DNA-based markers linked to resistance for Septoria nodorum blotch in durum wheat.

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