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Design and Progress in the Fabrication of an EUV Micro Exposure Tool Optics for PREUVE

文献类型： 会议论文

第一作者： Roland Geyl

作者： Roland Geyl 1 ; Jean Francois Tanne;

作者机构： 1.SAGEM Defense & Security Division Optronics Systems Department -

关键词： EUV;lithography;aspherics;polishing;testing;exposure tool

会议名称： Soft X-ray and EUV imaging systems II :

主办单位：

页码： 19-24

摘要： SAGEM, through its REOSC product line, is participating since November 1999 to PREUVE, the French EUV initiative, and work within this program especially in the field of EUV illumination and projection optics. After a short description of the PREUVE main lines of activity, we will detail our contributions to this program and work progress. This is mainly focused on basis EUV optics fabrication technology in order to ensure the fabrication of the entire optics assembly of an EUV micro exposure tool.

分类号： N5

  • 相关文献

[1]Gran Telescopio Canarias optics manufacture : Final Report. Roland GEYL,Michel TARREAU,Michel TARREAU. 2006

[2]SOFIA Primary Mirror Fabrication & Testing. Roland Geyl,Michel Tarreau,Patrick Plainchamp. 2001

[3]Large Aspheric Optics for High Power-High Energy Laser. Roland Geyl,Francois Houbre. 2001

[4]Cooled EUV collector optics for LPP and DPP sources. X. Bozec,L. Moine,R. Wevers,S. Djidel,R. Mercier Ythier,R. Geyl,V. Patoz. 2011

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