文献类型： 会议论文

第一作者： X. Bozec

作者： X. Bozec ¹ ; L. Moine ¹ ; R. Wevers ¹ ; S. Djidel ¹ ; R. Mercier Ythier ¹ ; R. Geyl ¹ ; V. Patoz ¹ ;

作者机构： 1.SAGEM REOSC, Avenue de la Tour Maury, 91280 St Pierre du Perray, France

关键词： Extreme UV;collector;normal incidence;13.5 nm;EUV source;lithography;smooth polishing;cooled mirrors

会议名称： SPIE Conference on Extreme Ultraviolet EUV Lithography

主办单位：

页码： 79690A:1-79690A:10

摘要： For several years Sagem has invested in technologies and engineering to develop innovative solutions for collecting optics for LPP and DPP EUV sources. Among the technological challenges for collecting mirrors, thermal control plays a very important role in avoiding degradation of in band EUV reflectivity and maintaining far field optical performance during scanner operation. Sagem proposes solutions based on a metallic mirror with embedded cooling circuits to stabilize the temperature of the mirror during source operation. Results of simulation as well as first technology validations obtained on prototypes will be shown to demonstrate the performance of the cooled mirror design. Another critical performance about the collector is the HSFR (micro roughness) requirements of the optical surface for limiting scattering and optimizing the in band EUV reflectivity. Thanks to the specific polishing process, HSFR values of below 2 Angstroms have been achieved on demonstrator metallic mirrors with high departure aspheres. Reflectivity measurements performed after coating of these parts with MoSi multilayers confirm that the obtained polishing quality is compliant with polishing specifications for high performance EUV optics. Finally, upcoming developments at Sagem in the field of EUV collecting optics will be presented.

分类号： N532