High numerical aperture silicon collimating lens for mid-infrared quantum cascade lasers manufactured using wafer-level techniques
文献类型： 会议论文
第一作者： Eric Logean
作者： Eric Logean 1 ; Lubos Hvozdara 1 ; Joab Di-Francesco 1 ; Hans Peter Herzig 1 ; Reinhard Voelkel 2 ; Martin Eisner 2 ; Pierre-Yves Baroni 3 ; Michel Rochat 3 ; Antoine Müller 3 ;
作者机构： 1.Optics & Photonics Technology Laboratory, Ecole Polytechnique Fédérale de Lausanne (EPFL), Rue A.-L. Breguet 2, 2000 Neuchatel, Switzerland
2.SUSS MicroOptics, Rue Jaquet-Droz 7, 2000 Neuchatel, Switzerland
3.Alpes Lasers S.A., Passage Max de Meuron 1-3, 2000 Neuchatel, Switzerland
关键词： Optical collimation;mid-infrared micro-optics;quantum cascade laser;reactive ion etching;mass production
会议名称： SPIE Conference on Optical Systems Design
主办单位：
页码： 85500Q-1-85500Q-6
摘要： We present an aspheric collimating lens for mid-infrared (4-14 μm) quantum cascade lasers. The lenses were etched into silicon by an inductively coupled plasma reactive ion etching system on wafer level. The high refractive index of silicon reduces the height of the lens profile resulting in a simple element working at high numerical aperture (up to 0.82). Wafer level processes enable the fabrication of about 5000 lenses in parallel. Such cost-effective collimating lens is a step towards the adoption of quantum cascade lasers for all its potential applications.
分类号： N-532
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